JPH0339299B2 - - Google Patents

Info

Publication number
JPH0339299B2
JPH0339299B2 JP1794983A JP1794983A JPH0339299B2 JP H0339299 B2 JPH0339299 B2 JP H0339299B2 JP 1794983 A JP1794983 A JP 1794983A JP 1794983 A JP1794983 A JP 1794983A JP H0339299 B2 JPH0339299 B2 JP H0339299B2
Authority
JP
Japan
Prior art keywords
thin film
photosensitive
light
layer
film layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1794983A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59143157A (ja
Inventor
Takeo Morya
Toshio Yamagata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kimoto Co Ltd
Original Assignee
Kimoto Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kimoto Co Ltd filed Critical Kimoto Co Ltd
Priority to JP58017949A priority Critical patent/JPS59143157A/ja
Publication of JPS59143157A publication Critical patent/JPS59143157A/ja
Publication of JPH0339299B2 publication Critical patent/JPH0339299B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP58017949A 1983-02-04 1983-02-04 製版用感光性マスク材料および製版用マスク版の製造方法 Granted JPS59143157A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58017949A JPS59143157A (ja) 1983-02-04 1983-02-04 製版用感光性マスク材料および製版用マスク版の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58017949A JPS59143157A (ja) 1983-02-04 1983-02-04 製版用感光性マスク材料および製版用マスク版の製造方法

Publications (2)

Publication Number Publication Date
JPS59143157A JPS59143157A (ja) 1984-08-16
JPH0339299B2 true JPH0339299B2 (en]) 1991-06-13

Family

ID=11958014

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58017949A Granted JPS59143157A (ja) 1983-02-04 1983-02-04 製版用感光性マスク材料および製版用マスク版の製造方法

Country Status (1)

Country Link
JP (1) JPS59143157A (en])

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0648379B2 (ja) * 1986-08-04 1994-06-22 富士写真フイルム株式会社 製版用マスクの作成方法及びマスク形成フイルム
JPH0652420B2 (ja) * 1987-05-28 1994-07-06 富士写真フイルム株式会社 マスク形成用フイルム及び画像形成用マスクの作成方法
WO2017131497A1 (ko) 2016-01-27 2017-08-03 주식회사 엘지화학 필름 마스크, 이의 제조방법 및 이를 이용한 패턴 형성 방법
KR102126110B1 (ko) 2016-01-27 2020-06-24 주식회사 엘지화학 필름 마스크, 이의 제조방법, 이를 이용한 패턴 형성 방법 및 이를 이용하여 형성된 패턴
KR102138960B1 (ko) * 2016-01-27 2020-07-28 주식회사 엘지화학 필름 마스크, 이의 제조방법, 이를 이용한 패턴 형성 방법 및 이를 이용하여 형성된 패턴

Also Published As

Publication number Publication date
JPS59143157A (ja) 1984-08-16

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